TWI471279B - Processing method and processing apparatus for a chemically strengthened glass substrate - Google Patents
Processing method and processing apparatus for a chemically strengthened glass substrate Download PDFInfo
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- TWI471279B TWI471279B TW102114242A TW102114242A TWI471279B TW I471279 B TWI471279 B TW I471279B TW 102114242 A TW102114242 A TW 102114242A TW 102114242 A TW102114242 A TW 102114242A TW I471279 B TWI471279 B TW I471279B
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- glass substrate
- chemically strengthened
- strengthened glass
- heating
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- 239000000758 substrate Substances 0.000 title claims description 165
- 239000005345 chemically strengthened glass Substances 0.000 title claims description 134
- 238000003672 processing method Methods 0.000 title claims description 25
- 238000010438 heat treatment Methods 0.000 claims description 116
- 238000005520 cutting process Methods 0.000 claims description 80
- 230000006835 compression Effects 0.000 claims description 37
- 238000007906 compression Methods 0.000 claims description 37
- 239000011521 glass Substances 0.000 claims description 27
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 16
- 238000001816 cooling Methods 0.000 claims description 14
- 230000000694 effects Effects 0.000 claims description 10
- 230000006698 induction Effects 0.000 claims description 9
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 claims description 8
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 8
- 239000001569 carbon dioxide Substances 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 239000001273 butane Substances 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 5
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 claims description 5
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 claims description 5
- JNDMLEXHDPKVFC-UHFFFAOYSA-N aluminum;oxygen(2-);yttrium(3+) Chemical compound [O-2].[O-2].[O-2].[Al+3].[Y+3] JNDMLEXHDPKVFC-UHFFFAOYSA-N 0.000 claims description 4
- 229910003460 diamond Inorganic materials 0.000 claims description 4
- 239000010432 diamond Substances 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims description 4
- 239000003209 petroleum derivative Substances 0.000 claims description 4
- 239000001294 propane Substances 0.000 claims description 4
- 229910019655 synthetic inorganic crystalline material Inorganic materials 0.000 claims description 4
- 229910019901 yttrium aluminum garnet Inorganic materials 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 238000003426 chemical strengthening reaction Methods 0.000 claims 1
- 230000002265 prevention Effects 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 150000002500 ions Chemical class 0.000 description 9
- 238000009792 diffusion process Methods 0.000 description 8
- 229910001414 potassium ion Inorganic materials 0.000 description 8
- 229910001415 sodium ion Inorganic materials 0.000 description 7
- 239000005341 toughened glass Substances 0.000 description 7
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 238000005728 strengthening Methods 0.000 description 3
- NPYPAHLBTDXSSS-UHFFFAOYSA-N Potassium ion Chemical compound [K+] NPYPAHLBTDXSSS-UHFFFAOYSA-N 0.000 description 2
- 238000006748 scratching Methods 0.000 description 2
- 230000002393 scratching effect Effects 0.000 description 2
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003763 resistance to breakage Effects 0.000 description 1
Landscapes
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Laser Beam Processing (AREA)
Description
本發明係關於一種用於一玻璃基板之加工方法及加工設備,特別是用於一化學強化玻璃基板之加工方法及加工設備。The invention relates to a processing method and a processing device for a glass substrate, in particular to a processing method and a processing device for a chemically strengthened glass substrate.
目前玻璃基板廣泛運用在電子產品之各種零件中,如螢幕、外殼等。為了避免玻璃基板輕易被刮傷或破裂,通常用於電子產品之玻璃基板均經過強化。在製造過程中,玻璃基板均需切割為較小尺寸之玻璃基板以配合各式電子零件之應用。然而,強化玻璃基板因其不易被切削或刮傷度高,以致較難以加工而容易加工不完整,或者因需要較大切削力而使強化玻璃基板容易破損或產生缺陷。At present, glass substrates are widely used in various parts of electronic products, such as screens and casings. In order to prevent the glass substrate from being easily scratched or broken, the glass substrate generally used for electronic products is reinforced. In the manufacturing process, the glass substrate needs to be cut into a smaller size glass substrate to match the application of various electronic parts. However, the tempered glass substrate is difficult to be cut or scratched so that it is difficult to process and is incompletely processed, or the tempered glass substrate is easily broken or defective due to the need for a large cutting force.
請參考圖1,化學強化玻璃基板1包含一拉伸層11及形成於拉伸層11上之至少一壓縮層12。其中,壓縮層12係將化學強化玻璃基板1中之部分鈉離子(Na+)置換為鉀離子(K+)所形成。因鉀離子之體積大於鈉離子,而使具較大未受力體積之壓縮層12因受到具較小未受力體積之拉伸層11之牽扯,而使拉伸層11具有拉伸內應力且壓縮層12具有壓縮內應力。Referring to FIG. 1 , the chemically strengthened glass substrate 1 includes a tensile layer 11 and at least one compression layer 12 formed on the tensile layer 11 . Here, the compression layer 12 is formed by replacing a part of sodium ions (Na+) in the chemically strengthened glass substrate 1 with potassium ions (K+). Since the volume of potassium ions is larger than the sodium ions, the compression layer 12 having a larger unstressed volume is subjected to the tensile layer 11 having a smaller unstressed volume, so that the tensile layer 11 has tensile internal stress. And the compression layer 12 has a compressive internal stress.
一習知技術為使化學強化玻璃基板1更易於切削,便採用加熱化學強化玻璃基板1之方式使其強化玻璃基板1發生應力緩和現象(Stress Relaxation Effect)。其中,應力緩和現象之發生原因包含:1.黏彈性 效應(Viscoelastic Effect)、及2.離子的相互擴散(Mutual Diffusion)。離子的相互擴散使壓縮層12中之鉀離子逐漸擴散至拉伸層11中,藉此降低化學強化玻璃基板1之壓縮層12壓縮內應力,以使化學強化玻璃基板1更易於切削。然而,若化學強化玻璃基板1發生離子擴散現象,即便化學強化玻璃基板1事後降溫,仍將使壓縮層12之壓縮內應力永久性地降低,使化學強化玻璃基板1較易於破損或刮傷。In a conventional technique, in order to make the chemically strengthened glass substrate 1 easier to cut, the glass substrate 1 is strengthened by chemically strengthening the glass substrate 1 to cause a stress relaxation effect (Stress Relaxation Effect). Among them, the causes of stress relaxation include: 1. Viscoelasticity Effect (Viscoelastic Effect), and 2. Mutual Diffusion of ions. The interdiffusion of ions causes the potassium ions in the compression layer 12 to gradually diffuse into the tensile layer 11, thereby reducing the compressive internal stress of the compression layer 12 of the chemically strengthened glass substrate 1, so that the chemically strengthened glass substrate 1 is easier to cut. However, if the chemically strengthened glass substrate 1 is subjected to ion diffusion, even if the chemically strengthened glass substrate 1 is cooled afterwards, the compressive internal stress of the compressive layer 12 is permanently lowered, and the chemically strengthened glass substrate 1 is easily broken or scratched.
有鑑於此,如何在切削階段降低化學強化玻璃基板1之壓縮層12之壓縮內應力,使化學強化玻璃基板1更易於切削,成品卻仍然維持化學強化玻璃基板1之抗破損及刮傷之特性,為此一業界亟待解決之問題。In view of this, how to reduce the compressive internal stress of the compressive layer 12 of the chemically strengthened glass substrate 1 during the cutting stage, so that the chemically strengthened glass substrate 1 is easier to cut, and the finished product maintains the resistance to breakage and scratching of the chemically strengthened glass substrate 1. For this reason, an industry has to solve the problem.
本發明之一目的在於提供一種用於一化學強化玻璃基板之加工方法及加工設備,使化學強化玻璃基板更易於切削加工。An object of the present invention is to provide a processing method and processing apparatus for a chemically strengthened glass substrate, which makes the chemically strengthened glass substrate easier to cut.
化學強化玻璃基板包含一拉伸層及形成於拉伸層上之至少一壓縮層,拉伸層具有拉伸內應力且壓縮層具有壓縮內應力。The chemically strengthened glass substrate comprises a stretched layer and at least one compressed layer formed on the stretched layer, the stretched layer has tensile internal stress and the compressed layer has a compressive internal stress.
為達上述目的,本發明之加工方法包含以下步驟:(a)於一加熱期間至少加熱化學強化玻璃基板之一預定加熱部份至一切削溫度,其中切削溫度實質上介於攝氏200至300度,以降低於預定加熱部份之壓縮層之壓縮內應力,並且加熱期間係小於10分鐘,以避免化學強化玻璃基板發生離子擴散現象;及(b)於預定加熱部份切削化學強化玻璃基板。To achieve the above object, the processing method of the present invention comprises the steps of: (a) heating at least one predetermined heating portion of the chemically strengthened glass substrate to a cutting temperature during a heating, wherein the cutting temperature is substantially between 200 and 300 degrees Celsius , to reduce the compressive internal stress of the compression layer of the predetermined heating portion, and the heating period is less than 10 minutes to avoid ion diffusion phenomenon of the chemically strengthened glass substrate; and (b) cutting the chemically strengthened glass substrate at the predetermined heating portion.
為達上述目的,本發明之加工設備包含一加熱頭及一切削頭。加熱頭用以於一加熱期間至少加熱化學強化玻璃基板之一預定加熱部份至一切削溫度,其中切削溫度實質上介於攝氏200至300度,以降低於預定加熱部份之壓縮層之壓縮內應力,並且加熱期間係小於10分 鐘,以避免化學強化玻璃基板發生離子擴散現象。切削頭用以於預定加熱部份切削化學強化玻璃基板。To achieve the above object, the processing apparatus of the present invention comprises a heating head and a cutting head. The heating head is configured to heat at least one predetermined heating portion of the chemically strengthened glass substrate to a cutting temperature during a heating, wherein the cutting temperature is substantially between 200 and 300 degrees Celsius to reduce compression of the compression layer of the predetermined heating portion Internal stress, and the heating period is less than 10 minutes Clock to avoid ion diffusion in the chemically strengthened glass substrate. The cutting head is used to cut the chemically strengthened glass substrate at a predetermined heating portion.
1‧‧‧化學強化玻璃基板1‧‧‧Chemically tempered glass substrate
11‧‧‧拉伸層11‧‧‧ Stretch layer
12‧‧‧壓縮層12‧‧‧Compression layer
3‧‧‧加工設備3‧‧‧Processing equipment
30‧‧‧預定加熱部份30‧‧‧Predetermined heating section
301‧‧‧預定切割線301‧‧‧Predetermined cutting line
303‧‧‧刻劃開口303‧‧‧ scribing openings
31‧‧‧加熱頭31‧‧‧Heating head
31a‧‧‧雷射源31a‧‧‧Laser source
31b‧‧‧燃燒器31b‧‧‧burner
31c‧‧‧熱風產生器31c‧‧‧hot air generator
33‧‧‧切削頭33‧‧‧ cutting head
35‧‧‧加熱平臺35‧‧‧heating platform
圖1係一化學強化玻璃基板之一剖面示意圖;圖2A至2C係本發明加工設備之個別實施態樣之示意圖;圖2D係本發明加工設備之使用加熱平台之一實施態樣之一示意圖;以及圖3係本發明加工設備之同時自化學強化玻璃基板之相對二側加工化學強化玻璃基板之一實施態樣之一示意圖。1 is a schematic cross-sectional view of a chemically strengthened glass substrate; FIGS. 2A to 2C are schematic views showing an embodiment of the processing apparatus of the present invention; and FIG. 2D is a schematic view showing one embodiment of a heating platform using the processing apparatus of the present invention; And Fig. 3 is a schematic view showing one embodiment of the chemically strengthened glass substrate processed from the opposite sides of the chemically strengthened glass substrate while the processing apparatus of the present invention is being used.
請參考圖1,本發明之加工方法係用於一化學強化玻璃基板1。化學強化玻璃基板1包含一拉伸層11及形成於拉伸層11上之至少一壓縮層12。其中,壓縮層12係將化學強化玻璃基板1中之部分體積較小但熱膨脹係數較大之離子置換為體積較大但熱膨脹係數較小之離子所形成,此種置換可使玻璃強化。例如,壓縮層12係將化學強化玻璃基板1中之部分體積較小但熱膨脹係數較大之鈉離子(Na+)置換為體積較大但熱膨脹係數較小之鉀離子(K+)所形成(本發明不僅限於此實施例)。Referring to FIG. 1, the processing method of the present invention is applied to a chemically strengthened glass substrate 1. The chemically strengthened glass substrate 1 includes a stretched layer 11 and at least one compressive layer 12 formed on the stretched layer 11. Among them, the compression layer 12 is formed by replacing ions having a small volume in the chemically strengthened glass substrate 1 but having a large thermal expansion coefficient with ions having a large volume but a small thermal expansion coefficient, and such replacement can strengthen the glass. For example, the compression layer 12 is formed by replacing a part of the chemically strengthened glass substrate 1 having a small volume but a large coefficient of thermal expansion (Na+) with a potassium ion (K+) having a large volume but a small thermal expansion coefficient. Not limited to this embodiment).
因鉀離子之體積大於鈉離子,而使具較大未受力體積之壓縮層12因受到具較小未受力體積之拉伸層11之牽扯,因此使拉伸層11具有拉伸內應力且壓縮層12具有壓縮內應力。本發明之加工方法所包含之步驟詳述如下。Since the volume of potassium ions is larger than the sodium ions, the compression layer 12 having a larger unstressed volume is subjected to the tensile layer 11 having a smaller unstressed volume, so that the tensile layer 11 has tensile internal stress. And the compression layer 12 has a compressive internal stress. The steps involved in the processing method of the present invention are detailed below.
在尚未對化學強化玻璃基板1進行切削等加工前,可維持化學強化玻璃基板1於介於攝氏25度至-55度間之一防損溫度,以維持壓縮層12之壓縮內應力而防止化學強化玻璃基板1易受到例如刮傷等損壞。The chemically strengthened glass substrate 1 can be maintained at a loss-proof temperature between 25 degrees Celsius and -55 degrees Celsius before the chemically strengthened glass substrate 1 is subjected to processing such as cutting to maintain the compressive internal stress of the compression layer 12 to prevent chemistry. The tempered glass substrate 1 is susceptible to damage such as scratches.
請參考圖2A至2C,當欲對化學強化玻璃基板1進行切削等加工 時,於一加熱期間至少加熱化學強化玻璃基板1之一預定加熱部份30至一切削溫度,以藉由拉伸層11中之鈉離子之熱膨脹係數大於壓縮層12中之鉀離子之熱膨脹係數,使拉伸層11之熱膨脹大於壓縮層12之熱膨脹,而降低於預定加熱部份30之壓縮層12之壓縮內應力。其中,切削溫度實質上介於攝氏200至300度。較佳地,切削溫度實質上係介於攝氏250±25度。Please refer to FIGS. 2A to 2C, when the chemically strengthened glass substrate 1 is to be processed by cutting or the like. At least one predetermined heating portion 30 of the chemically strengthened glass substrate 1 is heated to a cutting temperature during a heating period so that the coefficient of thermal expansion of the sodium ions in the tensile layer 11 is greater than the coefficient of thermal expansion of the potassium ions in the compression layer 12. The thermal expansion of the tensile layer 11 is greater than the thermal expansion of the compression layer 12, and is reduced by the compressive internal stress of the compression layer 12 of the predetermined heating portion 30. Among them, the cutting temperature is substantially between 200 and 300 degrees Celsius. Preferably, the cutting temperature is substantially between 250 ± 25 degrees Celsius.
在此需注意者係,加熱期間係小於10分鐘,以避免化學強化玻璃基板1發生應力緩和現象(Stress Relaxation Effect)。其中,應力緩和現象之發生原因包含:1.黏彈性效應(Viscoelastic Effect)、及2.離子的相互擴散(Mutual Diffusion)。離子的相互擴散造成壓縮層12中之鉀離子逐漸擴散至拉伸層11中。若化學強化玻璃基板1發生離子擴散現象,將使壓縮層12之壓縮內應力永久性地降低,使化學強化玻璃基板1較易於破損或刮傷。It should be noted here that the heating period is less than 10 minutes to avoid the stress relaxation effect of the chemically strengthened glass substrate 1. Among them, the causes of stress relaxation include: 1. Viscoelastic effect, and 2. Mutual Diffusion. The interdiffusion of ions causes the potassium ions in the compression layer 12 to gradually diffuse into the tensile layer 11. When the ion-diffusion phenomenon occurs in the chemically strengthened glass substrate 1, the compressive internal stress of the compressive layer 12 is permanently lowered, and the chemically strengthened glass substrate 1 is more likely to be damaged or scratched.
如圖2A至2C所示,若欲對化學強化玻璃基板1以加工設備3沿一預定切割線301切割,於此加熱步驟中則至少沿預定切割線301加熱化學強化玻璃基板1至切削溫度。As shown in FIGS. 2A to 2C, if the chemically strengthened glass substrate 1 is to be cut along the predetermined cutting line 301 by the processing apparatus 3, the chemically strengthened glass substrate 1 is heated at least along the predetermined cutting line 301 to the cutting temperature in this heating step.
於上述加熱以使化學強化玻璃基板1更易於切削加工之步驟中,可使用雷射、燃燒器、或熱風之各種加熱方式加熱預定加熱部份30。如圖2A所示,上述加熱步驟可藉由雷射源31a,產生波長10.6 μm之二氧化碳雷射、波長9.4 μm之二氧化碳雷射或釔鋁石榴石雷射(Yttrium Aluminum Garnet,YAG雷射)加熱預定加熱部份30。如圖2B所示,上述加熱步驟可藉由燃燒器31b燃燒丁烷(Butane)、丙烷(Propane)或石油製品之可燃燒物質,加熱預定加熱部份30。如圖2C所示,上述加熱步驟可藉由熱風產生器31c利用鎳鉻絲或感應加熱(induction heating),加熱氣體或產生水蒸氣,以產生熱風加熱預定加熱部份。如圖2D所示,上述加熱步驟可以電阻、感應加熱(induction heating)、燃燒器、或蒸汽加熱一加熱平臺35,並將化學強化玻璃基板1設置於加熱平臺35上,以至少局部地加熱化學強化玻璃基板1。In the above-described step of heating to make the chemically strengthened glass substrate 1 easier to be machined, the predetermined heating portion 30 may be heated by various heating methods such as laser, burner, or hot air. As shown in FIG. 2A, the above heating step can generate a carbon dioxide laser having a wavelength of 10.6 μm, a carbon dioxide laser having a wavelength of 9.4 μm, or a Yttrium Aluminum Garnet (YAG laser) heating by the laser source 31a. The heating portion 30 is predetermined. As shown in Fig. 2B, the above heating step can heat the predetermined heating portion 30 by burning the combustible material of butane, propane or petroleum products by the burner 31b. As shown in Fig. 2C, the above heating step may be performed by hot air generator 31c using nickel chrome wire or induction heating to heat the gas or generate water vapor to generate hot air to heat the predetermined heating portion. As shown in FIG. 2D, the above heating step can be electrical resistance, induction heating (induction) A heating platform 35 is heated by a burner, or a steam, and the chemically strengthened glass substrate 1 is placed on the heating stage 35 to at least partially heat the chemically strengthened glass substrate 1.
經過上述加熱步驟後,化學強化玻璃基板1於預定加熱部份30之壓縮層12之壓縮內應力已降低,使化學強化玻璃基板1於預定加熱部份30更易於切削加工。在此之後,以切削頭33於預定加熱部份30切削經加熱之化學強化玻璃基板1,可避免化學強化玻璃基板1因壓縮層12之壓縮內應力過大而切削不完整或因需要較大切削力而使化學強化玻璃基板1破損或造成缺陷。After the above heating step, the compressive internal stress of the chemically strengthened glass substrate 1 on the compression layer 12 of the predetermined heating portion 30 is lowered, making the chemically strengthened glass substrate 1 easier to cut at the predetermined heating portion 30. After that, the heated chemically strengthened glass substrate 1 is cut by the cutting head 33 at the predetermined heating portion 30, thereby preventing the chemically strengthened glass substrate 1 from being incompletely cut due to excessive compressive internal stress of the compression layer 12 or requiring large cutting. The chemically strengthened glass substrate 1 is broken or causes defects.
如圖2A至2C所示,於切削步驟中,可於壓縮層11上以切削頭33沿預定切割線301刻劃化學強化玻璃基1板以形成一刻劃開口303。其中,形成刻劃開口303之方法可以一切割輪、一鑽石刀或雷射為主體之切削頭33沿預定切割線301刻劃化學強化玻璃基板1。As shown in FIGS. 2A through 2C, in the cutting step, the chemically strengthened glass substrate 1 can be scored along the predetermined cutting line 301 by the cutting head 33 on the compression layer 11 to form a scored opening 303. The method of forming the scribe opening 303 may be to scribe the chemically strengthened glass substrate 1 along a predetermined cutting line 301 by a cutting wheel, a diamond knife or a laser-based cutting head 33.
上述切削步驟中,所謂的切削,除上述對化學強化玻璃基板1進行沿預定切割線301刻劃化學強化玻璃基板1以形成刻劃開口303而切割化學強化玻璃基板1外,更可為對化學強化玻璃基板1進行鑽孔或去除表面。In the above-described cutting step, the so-called cutting is performed by cutting the chemically strengthened glass substrate 1 along the predetermined cutting line 301 to form the scribed glass 303, and cutting the chemically strengthened glass substrate 1 in addition to the above-described cutting. The tempered glass substrate 1 is drilled or the surface is removed.
於一實施例中,如圖3所示,上述加熱步驟及切削步驟可同時自化學強化玻璃基板1之相對二側分別加熱並切削化學強化玻璃基板1。其中,圖3所示之化學強化玻璃基板1可為單獨一片玻璃基板或包含二片相互貼合之玻璃基板。當圖3所示之化學強化玻璃基板1為單獨一片玻璃基板時,則係對僅包含單獨一片玻璃基板之化學強化玻璃基板1之正反面同時進行上述加熱步驟及切削步驟。當圖3所示之化學強化玻璃基板1包含二片相互貼合之玻璃基板時,則對化學強化玻璃基板1之二片相互貼合之玻璃基板自正反面同時進行上述加熱步驟及切削步驟。In one embodiment, as shown in FIG. 3, the heating step and the cutting step can simultaneously heat and cut the chemically strengthened glass substrate 1 from opposite sides of the chemically strengthened glass substrate 1, respectively. The chemically strengthened glass substrate 1 shown in FIG. 3 may be a single glass substrate or two glass substrates bonded to each other. When the chemically strengthened glass substrate 1 shown in FIG. 3 is a single glass substrate, the heating step and the cutting step are simultaneously performed on the front and back surfaces of the chemically strengthened glass substrate 1 including only a single glass substrate. When the chemically strengthened glass substrate 1 shown in FIG. 3 includes two glass substrates bonded to each other, the glass substrate to which the chemically strengthened glass substrates 1 are bonded to each other is subjected to the heating step and the cutting step simultaneously from the front and back surfaces.
於切削步驟後,可冷卻化學強化玻璃基板1,以幫助或加速化學 強化玻璃基板1沿刻劃開口303分裂為複數部分。其中,於此步驟中係冷卻化學強化玻璃基板1至介於攝氏2度至-55度間之一分裂溫度。After the cutting step, the chemically strengthened glass substrate 1 can be cooled to help or accelerate the chemistry The tempered glass substrate 1 is split into a plurality of portions along the scribe opening 303. Wherein, in this step, the chemically strengthened glass substrate 1 is cooled to a splitting temperature between 2 and -55 degrees Celsius.
上述冷卻步驟可以各種習知方法冷卻化學強化玻璃基板1,例如可藉由自然冷卻化學強化玻璃基板1,或以水、冷風、低溫液體或低溫氣體強制冷卻化學強化玻璃基板1。The above cooling step may cool the chemically strengthened glass substrate 1 by various conventional methods, for example, by chemically strengthening the glass substrate 1 by natural cooling, or by forcibly cooling the chemically strengthened glass substrate 1 with water, cold air, a cryogenic liquid or a low temperature gas.
以下將詳述應用本發明上述加工方法所用之加工設備3。如圖2A至2C所示,本發明之加工設備3係用於如上所述之化學強化玻璃基板1,其包含一加熱頭31及一切削頭33。The processing apparatus 3 used in the above-described processing method of the present invention will be described in detail below. As shown in FIGS. 2A to 2C, the processing apparatus 3 of the present invention is used for the chemically strengthened glass substrate 1 as described above, which comprises a heating head 31 and a cutting head 33.
加熱頭31用以於一加熱期間至少加熱化學強化玻璃基板1之一預定加熱部份30至一切削溫度。其中,切削溫度實質上介於攝氏200至300度,以藉由拉伸層11中之鈉離子之熱膨脹係數大於壓縮層12中之鉀離子之熱膨脹係數,使拉伸層11之熱膨脹大於壓縮層12之熱膨脹,而降低於預定加熱部份30之壓縮層12之壓縮內應力,以使化學強化玻璃基板1於預定加熱部份30更易於切削加工。較佳地,加熱頭31加熱化學強化玻璃基板1之切削溫度實質上係介於攝氏250±25度。The heating head 31 is for heating at least a predetermined heating portion 30 of the chemically strengthened glass substrate 1 to a cutting temperature during a heating. Wherein, the cutting temperature is substantially between 200 and 300 degrees Celsius, so that the thermal expansion coefficient of the sodium ion in the tensile layer 11 is greater than the thermal expansion coefficient of the potassium ion in the compression layer 12, so that the thermal expansion of the tensile layer 11 is greater than that of the compression layer. The thermal expansion of 12 is lowered by the compressive internal stress of the compression layer 12 of the predetermined heating portion 30, so that the chemically strengthened glass substrate 1 is more easily machined at the predetermined heating portion 30. Preferably, the cutting temperature at which the heating head 31 heats the chemically strengthened glass substrate 1 is substantially between 250 ± 25 degrees Celsius.
在此需注意者係,加熱期間係小於10分鐘,以避免化學強化玻璃基板1發生離子擴散現象,而造成壓縮層12中之鉀離子逐漸擴散至拉伸層11中。若化學強化玻璃基板1發生離子擴散現象,將使壓縮層12之壓縮內應力永久性地降低,使化學強化玻璃基板1較易於破損或刮傷。It should be noted here that the heating period is less than 10 minutes to avoid the ion diffusion phenomenon of the chemically strengthened glass substrate 1, and the potassium ions in the compression layer 12 are gradually diffused into the tensile layer 11. When the ion-diffusion phenomenon occurs in the chemically strengthened glass substrate 1, the compressive internal stress of the compressive layer 12 is permanently lowered, and the chemically strengthened glass substrate 1 is more likely to be damaged or scratched.
加熱頭31可使用各種加熱方式。例如,以雷射、燃燒器、或熱風等方式加熱預定加熱部份30。The heating head 31 can use various heating methods. For example, the predetermined heating portion 30 is heated by a laser, a burner, or a hot air.
如圖2A所示,加熱頭31可為一雷射源31a,並以波長10.6 μm之二氧化碳雷射、波長9.4 μm之二氧化碳雷射或釔鋁石榴石雷射(Yttrium Aluminum Garnet,YAG雷射)加熱預定加熱部份30。As shown in FIG. 2A, the heating head 31 can be a laser source 31a and emits a carbon dioxide laser having a wavelength of 10.6 μm, a carbon dioxide laser having a wavelength of 9.4 μm or a Yttrium Aluminum Garnet (YAG laser). The predetermined heating portion 30 is heated.
如圖2B所示,加熱頭31可為一燃燒器31b,並以燃燒丁烷 (Butane)、丙烷(Propane)或石油製品,加熱預定加熱部份30。As shown in FIG. 2B, the heating head 31 can be a burner 31b and burns butane. (Butane), propane or petroleum product, heating the predetermined heating portion 30.
如圖2C所示,加熱頭31可為一熱風產生器31c,並利用鎳鉻絲或感應加熱(induction heating),加熱氣體或產生水蒸氣,以產生熱風加熱預定加熱部份30。As shown in Fig. 2C, the heating head 31 may be a hot air generator 31c, and uses a nickel-chromium wire or induction heating to heat the gas or generate water vapor to generate hot air to heat the predetermined heating portion 30.
如圖2D所示,加熱頭31可包含一加熱平臺35,並以電阻、感應加熱(induction heating)、燃燒器、或蒸汽加熱加熱平臺35。如圖2D所示,化學強化玻璃基板1係設置於加熱平臺35上,以至少局部地加熱化學強化玻璃基板1。As shown in FIG. 2D, the heating head 31 can include a heating platform 35 and heat the platform 35 with electrical resistance, induction heating, burners, or steam. As shown in FIG. 2D, the chemically strengthened glass substrate 1 is provided on the heating stage 35 to at least partially heat the chemically strengthened glass substrate 1.
如圖2A至2C所示,若欲對化學強化玻璃基板1沿一預定切割線301切割,加熱頭31係至少先沿預定切割線301加熱化學強化玻璃基板1至切削溫度。As shown in FIGS. 2A to 2C, if the chemically strengthened glass substrate 1 is to be cut along a predetermined cutting line 301, the heating head 31 heats the chemically strengthened glass substrate 1 at least along the predetermined cutting line 301 to the cutting temperature.
如圖2A至2C所示,加熱頭31加熱預定加熱部份30後,切削頭33用以於預定加熱部份30切削化學強化玻璃基板1。As shown in Figs. 2A to 2C, after the heating head 31 heats the predetermined heating portion 30, the cutting head 33 is used to cut the chemically strengthened glass substrate 1 at the predetermined heating portion 30.
如圖2A至2C所示,於一實施態樣中,切削頭33係於壓縮層12上沿預定切割線301刻劃化學強化玻璃基板1以形成一刻劃開口303。其中,切削頭33可以一切割輪、一鑽石刀或雷射沿預定切割線刻劃化學強化玻璃基板1以形成刻劃開口303。As shown in FIGS. 2A through 2C, in one embodiment, the cutting head 33 is scribed on the compression layer 12 along the predetermined cutting line 301 to scribe the chemically strengthened glass substrate 1 to form a scribe opening 303. Wherein, the cutting head 33 can score the chemically strengthened glass substrate 1 along a predetermined cutting line by a cutting wheel, a diamond knife or a laser to form the scribe opening 303.
切削頭33除上述沿預定切割線301刻劃化學強化玻璃基板1以形成刻劃開口303而切割化學強化玻璃基板1外,亦可對化學強化玻璃基板1進行鑽孔或去除表面等切削。In addition to the above-described cutting of the chemically strengthened glass substrate 1 along the predetermined cutting line 301 to form the scribe opening 303 to cut the chemically strengthened glass substrate 1, the cutting head 33 may also perform drilling or removal of the surface of the chemically strengthened glass substrate 1.
於一實施例中,如圖3所示,加熱頭31及切削頭33可同時自化學強化玻璃基板1之相對二側分別加熱並切削化學強化玻璃基板1。其中,圖3所示之化學強化玻璃基板1可為單獨一片玻璃基板或包含二片相互貼合之玻璃基板。當圖3所示之化學強化玻璃基板1為單獨一片玻璃基板時,則係對僅包含單獨一片玻璃基板之化學強化玻璃基板1之正反面同時進行上述加熱步驟及切削步驟。當圖3所示之化學強化玻 璃基板1包含二片相互貼合之玻璃基板時,則對化學強化玻璃基板1之二片相互貼合之玻璃基板自正反面同時進行上述加熱步驟及切削步驟。In one embodiment, as shown in FIG. 3, the heating head 31 and the cutting head 33 can simultaneously heat and cut the chemically strengthened glass substrate 1 from opposite sides of the chemically strengthened glass substrate 1, respectively. The chemically strengthened glass substrate 1 shown in FIG. 3 may be a single glass substrate or two glass substrates bonded to each other. When the chemically strengthened glass substrate 1 shown in FIG. 3 is a single glass substrate, the heating step and the cutting step are simultaneously performed on the front and back surfaces of the chemically strengthened glass substrate 1 including only a single glass substrate. When the chemically strengthened glass shown in Figure 3 When the glass substrate 1 includes two glass substrates bonded to each other, the glass substrate to which the chemically strengthened glass substrate 1 is bonded to each other is subjected to the heating step and the cutting step simultaneously from the front and back surfaces.
本發明之加工設備3較佳地實例係在加熱頭31加熱化學強化玻璃基板1之預定加熱部份30前,維持化學強化玻璃基板1於介於攝氏25至-55度間之一防損溫度,以維持壓縮層12之壓縮內應力而防止化學強化玻璃基板1受到例如刮傷等損壞。The processing apparatus 3 of the present invention is preferably exemplified by maintaining the chemically strengthened glass substrate 1 at an anti-loss temperature between 25 and -55 degrees Celsius before the heating head 31 heats the predetermined heating portion 30 of the chemically strengthened glass substrate 1. The chemically strengthened glass substrate 1 is prevented from being damaged by, for example, scratching or the like in order to maintain the compressive internal stress of the compression layer 12.
本發明之加工設備3較佳地更包含一冷卻裝置(圖未示)。冷卻裝置用以於切削頭33切削化學強化玻璃基板1後冷卻化學強化玻璃基板1,以幫助或加速化學強化玻璃基板1沿刻劃開口303分裂為複數部分。其中,冷卻裝置係可冷卻化學強化玻璃基板1至介於攝氏25至-55度間之一分裂溫度。The processing apparatus 3 of the present invention preferably further includes a cooling device (not shown). The cooling device is used to cool the chemically strengthened glass substrate 1 after the cutting head 33 cuts the chemically strengthened glass substrate 1 to help or accelerate the chemically strengthened glass substrate 1 to be split into a plurality of portions along the scribing opening 303. Among them, the cooling device can cool the chemically strengthened glass substrate 1 to a splitting temperature between 25 and -55 degrees Celsius.
冷卻裝置可以各種習知方法冷卻化學強化玻璃基板1,例如藉由自然冷卻化學強化玻璃基板1,或以水、冷風、低溫液體或低溫氣體強制冷卻化學強化玻璃基板1。The cooling device can cool the chemically strengthened glass substrate 1 by various conventional methods, for example, by chemically strengthening the glass substrate 1 by natural cooling, or forcibly cooling the chemically strengthened glass substrate 1 with water, cold air, a cryogenic liquid or a low temperature gas.
1‧‧‧化學強化玻璃基板1‧‧‧Chemically tempered glass substrate
3‧‧‧加工設備3‧‧‧Processing equipment
30‧‧‧預定加熱部份30‧‧‧Predetermined heating section
301‧‧‧預定切割線301‧‧‧Predetermined cutting line
303‧‧‧刻劃開口303‧‧‧ scribing openings
31‧‧‧加熱頭31‧‧‧Heating head
31a‧‧‧雷射源31a‧‧‧Laser source
33‧‧‧切削頭33‧‧‧ cutting head
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| CN101489746A (en) * | 2006-07-20 | 2009-07-22 | 田北技研株式会社 | Cutting device |
| CN102060437A (en) * | 2009-10-06 | 2011-05-18 | 株式会社莱奥 | Brittle material thermal stress cutting method based on large-area uneven temperature distribution and thermal stress cutting device |
| TW201240931A (en) * | 2011-01-11 | 2012-10-16 | Asahi Glass Co Ltd | Cutting method for strengthened glass plate |
| CN102749746A (en) * | 2012-06-21 | 2012-10-24 | 深圳市华星光电技术有限公司 | Liquid crystal substrate cutting device and liquid crystal substrate cutting method |
| JP2013035721A (en) * | 2011-08-09 | 2013-02-21 | Asahi Glass Co Ltd | Method for producing glass plate, and chemically strengthened glass for display device |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101489746A (en) * | 2006-07-20 | 2009-07-22 | 田北技研株式会社 | Cutting device |
| CN102060437A (en) * | 2009-10-06 | 2011-05-18 | 株式会社莱奥 | Brittle material thermal stress cutting method based on large-area uneven temperature distribution and thermal stress cutting device |
| TW201240931A (en) * | 2011-01-11 | 2012-10-16 | Asahi Glass Co Ltd | Cutting method for strengthened glass plate |
| JP2013035721A (en) * | 2011-08-09 | 2013-02-21 | Asahi Glass Co Ltd | Method for producing glass plate, and chemically strengthened glass for display device |
| CN102749746A (en) * | 2012-06-21 | 2012-10-24 | 深圳市华星光电技术有限公司 | Liquid crystal substrate cutting device and liquid crystal substrate cutting method |
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